File:Bringing Polymer Patterns into Focus (5940988602).jpg

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Bringing_Polymer_Patterns_into_Focus_(5940988602).jpg(169 × 250 pixels, file size: 11 KB, MIME type: image/jpeg)

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Working at the NIST Center for Neutron Research, chemical engineer Eric Lin places a semiconductor wafer in the path of a focused neutron beam. The beam is used to determine the size and shape of polymer patterns on the silicon wafer. Twenty-eight magnesium fluoride lenses focus the neutron beam so that the instrument can characterize polymer structures between 100-300 nanometers wide.

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Source Bringing Polymer Patterns into Focus
Author National Institute of Standards and Technology

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This image is in the public domain in the United States because it is a work of the United States Federal Government, specifically an employee of the National Institute of Standards and Technology, under the terms of Title 17, Chapter 1, Section 105 of the US Code.

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This image was originally posted to Flickr by National Institute of Standards and Technology at https://flickr.com/photos/63059536@N06/5940988602. It was reviewed on 7 September 2016 by FlickreviewR and was confirmed to be licensed under the terms of the United States Government Work.

7 September 2016

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Date/TimeThumbnailDimensionsUserComment
current02:19, 7 September 2016Thumbnail for version as of 02:19, 7 September 2016169 × 250 (11 KB)Vanished Account Byeznhpyxeuztibuo (talk | contribs)Transferred from Flickr via Flickr2Commons

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