File:LOCOS birds beak DE.svg

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LOCOS_birds_beak_DE.svg‎ (SVG file, nominally 485 × 326 pixels, file size: 9 KB)

[edit] Summary

Description
English: Detail cross section at the edge of an isolation windows after a simple LOCOS process. The schematic shows partial growth of Silicon dioxide into the silicon substrate and distortion of the silicon nitrite mask because of volume increase under the mask.
Deutsch: Schnitt an der Kante eines Isolationsfenster nach einem einfachen LOCOS-Prozess. Zusehen ist das teilweise Wachstum in das Silicium-Substrat und die Verbiegung der Siliciumnitritmaske durch die Volumenzunahme auch unter der Maske.
Date

21 January 2009(2009-01-21)
Source

Own work
Author

Cepheiden
Permission
(Reusing this image)

See below.

[edit] Licensing

Public domain I, the copyright holder of this work, hereby release it into the public domain. This applies worldwide.

In case this is not legally possible:
I grant anyone the right to use this work for any purpose, without any conditions, unless such conditions are required by law.

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Date/TimeThumbnailDimensionsUserComment
current07:51, 22 January 2009Thumbnail for version as of 07:51, 22 January 2009485×326 (9 KB)Cepheiden (Talk | contribs) ( removed bitmap link)
22:02, 21 January 2009Thumbnail for version as of 22:02, 21 January 2009485×400 (9 KB)Cepheiden (Talk | contribs) ({{Information |Description={{en|1=Detail cross section at the edge of an isolation windows after a simple LOCOS process. The schematic shows partial growth of Silicon dioxide into the silicon substrate and distortion of the silicon nitrite mask because of)

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