File:Argonne's Tribology Lab Plasma-Assisted Chemical-Vapor Deposition.jpg

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Description This commercial system was designed for the semiconductor field and contains three 8"-diameter targets that can be run individually or simultaneously to deposit metallic or dielectric film son substrates ranging up to 24" in diameter. See the entire <a href="http://www.transportation.anl.gov/facilities/tribology_tour.html">Tribology Laboratory photo tour</a>. View more about Argonne's transportation research at <a href="http://www.transportation.anl.gov">www.transportation.anl.gov</a>. Photo courtesy of <a href="http://www.anl.gov">Argonne National Laboratory</a>.
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Source Flickr: Argonne's Tribology Lab: Plasma-Assisted Chemical-Vapor Deposition
Author Argonne National Laboratory
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This image, which was originally posted to Flickr, was uploaded to Commons using Flickr upload bot on 27 October 2011, 02:16 by Oaktree b. On that date, it was confirmed to be licensed under the terms of the license indicated.
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current02:17, 27 October 2011Thumbnail for version as of 02:17, 27 October 20113,000 × 2,855 (2.66 MB)Flickr upload bot (talk | contribs)Uploaded from http://flickr.com/photo/35734278@N05/3469453524 using Flickr upload bot

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