File:E-beam Marker.JPG
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Русский: Маркер в виде креста, сформированный методами электронно-лучевой литографии на плоской поверхности. По перекрестию маркера происходит точное совмещение структур в случае, если литография проводится несколько раз на одной и той же подоложке. Система маркеров почти всегда формируются при первой литографии. Квадрат, налезающий на маркер - это область, которая была просканирована электронным лучём для позиционирования луча относительно уже имеющегося рисунка.
Снимок сделан с помощью растрового электронного микроскопа. Снимок может подойти к вот этой статье: https://ru.wikipedia.org/wiki/%D0%AD%D0%BB%D0%B5%D0%BA%D1%82%D1%80%D0%BE%D0%BD%D0%BD%D0%B0%D1%8F_%D0%BB%D0%B8%D1%82%D0%BE%D0%B3%D1%80%D0%B0%D1%84%D0%B8%D1%8FEnglish: A cruciform marker formed by electron-beam lithography on a flat surface. Its crossair is for precise alignment of different structures to each other. Alignment is required when electron beam lithography is carried out several times on the same substrate. In most cases markers are formed at the first lithography procedure. A square laying on the marker is a field scanned by electron beam before second lithography. Information collected during this scanning allows to correct electron beam position.
This image was obtained using a scanning electron microscope. It can be an illustration for this article: https://en.wikipedia.org/wiki/Electron-beam_lithography English: A cruciform marker formed by electron-beam lithography on a flat surface. Its crossair is for precise alignment of different structures to each other. Alignment is required when electron beam lithography is carried out several times on the same substrate. In most cases markers are formed at the first lithography procedure. A square laying on the marker is a field scanned by electron beam before second lithography. Information collected during this scanning allows to correct electron beam position. This image was obtained using a scanning electron microscope. It can be an illustration for this article: https://en.wikipedia.org/wiki/Electron-beam_lithography |
| Date | |
| Source | Own work |
| Author | Дагесян Саркис Арменакович |
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This image was uploaded as part of European Science Photo Competition 2015. |
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| current | 21:57, 14 November 2015 | | 1,024 × 704 (70 KB) | Capkuckokos (talk | contribs) | User created page with UploadWizard |
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