File:PVD-CVD.jpg
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Summary
[edit]DescriptionPVD-CVD.jpg |
English: Representation of a coating from the group of physical vapor deposition (PVD), such as the thermal evaporation. In this method, a material in vacuum environment is heated/evaporated (thermal, laser or electron bombardment) in an evaporator and the resulting material vapor spreads straight from the evaporator in the direction of the substrate.
Deutsch: Darstellung eine Beschichtungsanlage aus der Gruppe der physikalische Gasphasenabscheidung (engl. physical vapor deposition, PVD), beispielsweise das thermische Verdampfen. Bei diesem Verfahren wird ein Material in Vakuumumgebung in einem Verdampfer erhitzt/verdampft (thermisch, durch Laser oder Elektronenbeschuss), der entstehende Materialdampf breitet sich geradlinig vom Verdampfer in Richtung Substrat aus. |
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Author | Dipl-ing-metaller | ||
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File history
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 07:26, 9 February 2014 | 759 × 618 (51 KB) | Cepheiden (talk | contribs) | Reverted to version as of 14:41, 7 September 2010; no watermarks and ugly border shadows | |
13:59, 3 March 2013 | 808 × 682 (94 KB) | Mrsos256 (talk | contribs) | Reverted to version as of 07:21, 6 September 2010 | ||
14:41, 7 September 2010 | 759 × 618 (51 KB) | Cepheiden (talk | contribs) | cropped; without shadow | ||
12:42, 7 September 2010 | 808 × 682 (90 KB) | Dipl-ing-metaller (talk | contribs) | Wasserzeichen entfernt | ||
07:21, 6 September 2010 | 808 × 682 (94 KB) | Dipl-ing-metaller (talk | contribs) | {{Information |Description={{en|1=The vacuum based processes are basically distinguished into physical vapor deposition (PVD) and chemical vapor deposition (CVD). With these two methods of thin-film technology coating thicknesses from some 100nm up to a f |
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