File:Trench doubling.JPG

Summary[edit]

DescriptionTrench doubling.JPG	English: The basic process for doubling trenches or holes. Top: Photoresist is coated over the starting trench or hole pattern. Center: Holes or trenches are exposed and etched into the underlying layer. Bottom: Photoresist is removed, leaving the sum of the previous and new patterns.
Date	8 March 2008
Source	Own work (Original caption: " Own work ") Transferred from en.wikipedia to Commons by User:Cepheiden using CommonsHelper.
Author	Guiding light at en.wikipedia
Other versions	File:Trench doubling.svg is a vector version of this file. It should be used in place of this JPG file. File:Trench doubling.JPG → File:Trench doubling.svg For more information, see Help:SVG. In other languages Alemannisch ∙ Bahasa Indonesia ∙ Bahasa Melayu ∙ British English ∙ català ∙ čeština ∙ dansk ∙ Deutsch ∙ eesti ∙ English ∙ español ∙ Esperanto ∙ euskara ∙ français ∙ Frysk ∙ galego ∙ hrvatski ∙ Ido ∙ italiano ∙ lietuvių ∙ magyar ∙ Nederlands ∙ norsk bokmål ∙ norsk nynorsk ∙ occitan ∙ Plattdüütsch ∙ polski ∙ português ∙ português do Brasil ∙ română ∙ Scots ∙ sicilianu ∙ slovenčina ∙ slovenščina ∙ suomi ∙ svenska ∙ Tiếng Việt ∙ Türkçe ∙ vèneto ∙ Ελληνικά ∙ беларуская (тарашкевіца) ∙ български ∙ македонски ∙ нохчийн ∙ русский ∙ српски / srpski ∙ татарча/tatarça ∙ українська ∙ ქართული ∙ հայերեն ∙ বাংলা ∙ தமிழ் ∙ മലയാളം ∙ ไทย ∙ 한국어 ∙ 日本語 ∙ 简体中文 ∙ 繁體中文 ∙ עברית ∙ العربية ∙ فارسی ∙ +/−

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Original upload log[edit]

• 2008-03-08 09:19 Guiding light 393×488× (11119 bytes) The basic process for doubling trenches or holes. Top: Photoresist is coated over the starting trench or hole pattern. Center: Holes or trenches are exposed and etched into the underlying layer. Bottom: Photoresist is removed, leaving the sum of the prev