File:Immersionlithografie - Auflösungsvorteil.svg
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Summary[edit]
| Description |
English: Improved resolution in immersion lithography compared to conventional dry lithography by using the possibility of a higher numerical aperture.
Deutsch: Verbesserung des Auflösungsvermögens bei der Immersionslithografie im Vergleich zur konventionellen trockenen Fotolithografie durch die Möglichkeit eine höhere numerische Apertur nutzen zu können. (Beispielbrechzahlen: Luft = 1,0; Wasser = 1,44; Quarzlinse = 1,56; Fotolack = 1,75, vgl. BJ Lin: SPIE PM - 190 - Optical lithography -- Here is why. SPIE Press, 2010, ISBN 978-0819475602, Seite 327) |
| Date | |
| Source | Own work |
| Author | Cepheiden |
| SVG development |  This W3C-invalid diagram was created with Inkscape, or with something else.  This diagram uses embedded text that can be easily translated using a text editor. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 18:24, 19 January 2012 | | 400 × 300 (16 KB) | Cepheiden (talk | contribs) | fix |
| 18:20, 19 January 2012 |  | 400 × 300 (16 KB) | Cepheiden (talk | contribs) | calculated angles (air n=1; water n=1.44; lense/quarz n = 1,56; resist n=1,75) | |
| 18:02, 10 January 2012 |  | 400 × 300 (14 KB) | Cepheiden (talk | contribs) | {{Information |Description ={{en|1=Improved resolution in immersion lithography compared to conventional dry lithography by using the possibility of a higher numerical aperture.}} {{de|1=Verbesserung des Auflösungsvermögens bei der Immersionslithogra |
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