File:Lithography Wavelength vs Resolution.PNG
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Lithography_Wavelength_vs_Resolution.PNG (430 × 390 pixels, file size: 7 KB, MIME type: image/png)
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[edit]DescriptionLithography Wavelength vs Resolution.PNG |
English: The lithography wavelength has not changed much to match the required resolution. The required resolution has been achieved when necessary by a combination of resolution enhancement techniques such as off-axis illumination and phase-shift masks, higher numerical aperture lenses, and more recently fluid immersion. Beyond 45 nm node, the 193 nm wavelength is further extended by double patterning. |
Date | 19 October 2008 (original upload date) |
Source | Transferred from en.wikipedia to Commons. |
Author | Guiding light at English Wikipedia |
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[edit]The original description page was here. All following user names refer to en.wikipedia.
Date/Time | Dimensions | User | Comment |
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2008-10-19 04:24 | 430×390× (7521 bytes) | Guiding light | The lithography wavelength has not changed much to match the required resolution. The required resolution has been achieved when necessary by a combination of resolution enhancement techniques such as off-axis illumination and [[phase-shift masks]], highe |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 10:07, 28 February 2016 | 430 × 390 (7 KB) | FastilyClone (talk | contribs) | Transferred from enwp |
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