File:Mask-assisted spacer self-trimming.png

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Original file ‎(1,177 × 287 pixels, file size: 10 KB, MIME type: image/png)

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Summary[edit]

Description
English: A subresolution feature on the photomask may be processed to generate a sloped sidewall that allows the spacer to be etched away. The process is a low-contrast development process such as used for developable BARCs.

References

  • F. T. Chen et al., Proc. SPIE vol. 8683, 868311 (2013).
  • U.S. Patent 6114071.
  • U.S. Patent 8715891.
Date
Source PowerPoint drawing
Author Guiding light

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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.
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Attribution: Guiding light at English Wikipedia
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Original upload log[edit]

The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2016-04-21 13:49 1177×287× (10122 bytes) Guiding light reduced white space
2016-04-21 13:45 1177×351× (10574 bytes) Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

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Date/TimeThumbnailDimensionsUserComment
current02:55, 4 June 2016Thumbnail for version as of 02:55, 4 June 20161,177 × 287 (10 KB)OgreBot (talk | contribs)(BOT): Reverting to most recent version before archival
02:55, 4 June 2016Thumbnail for version as of 02:55, 4 June 20161,177 × 351 (10 KB)OgreBot (talk | contribs)(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2016-04-21 13:45:05 by Guiding light
21:55, 3 June 2016Thumbnail for version as of 21:55, 3 June 20161,177 × 287 (10 KB)FastilyClone (talk | contribs)Transferred from en.wikipedia (MTC!)

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