File:Photolithography etching process (DE).svg
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Size of this PNG preview of this SVG file: 376 × 599 pixels. Other resolutions: 150 × 240 pixels | 301 × 480 pixels | 482 × 768 pixels | 642 × 1,024 pixels | 1,285 × 2,048 pixels | 512 × 816 pixels.
Original file (SVG file, nominally 512 × 816 pixels, file size: 14 KB)
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Summary
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English: Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale.
Deutsch: Vereinfachte Darstellung des Trockenätzens einer Oxidschicht mithilfe eines Fotolithografieprozesses mit positivem Fotoresist. Hinweis: Nicht maßstabsgetreu. |
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This is a retouched picture, which means that it has been digitally altered from its original version. Modifications: translation, new arrangement. The original can be viewed here: Photolithography etching process.svg:  . Modifications made by Cepheiden.
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Licensing
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I, the copyright holder of this work, hereby publish it under the following licenses:
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
[edit].svg&action=edit§ion=3){kind=link}
This image is a derivative work of the following images:
- File:Photolithography_etching_process.svg licensed with Cc-by-sa-3.0, GFDL
- 2011-10-09T16:52:36Z Cmglee 512x2560 (5417 Bytes) Align text, change enumeration and change colour to match [[:Image:CMOS_fabrication_process.svg]].
- 2011-09-30T22:03:22Z Cmglee 512x2560 (5226 Bytes) Merge develop and remove exposed photoresist.
- 2011-09-29T22:46:12Z Cmglee 512x2926 (5402 Bytes) Fix text alignment.
- 2011-09-29T22:39:16Z Cmglee 512x2926 (5394 Bytes) Fix text alignment.
- 2011-09-29T22:37:04Z Cmglee 512x2926 (5374 Bytes) Fix text alignment.
- 2011-09-29T22:30:13Z Cmglee 512x3413 (5394 Bytes) {{Information |Description ={{en|1=Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. }} |Source ={{own}} |Author =[[User:
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File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:05, 13 December 2011 | | 512 × 816 (14 KB) | Cepheiden (talk | contribs) | fixes |
| 10:03, 13 December 2011 |  | 512 × 816 (13 KB) | Cepheiden (talk | contribs) | == {{int:filedesc}} == {{Information |Description={{en|1=Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale.}} {{de|1=Vereinfachte Darstellung des Trock |
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