File:Cermets 4 High Temperature Firing of Steatite Chip placing substrate in firing kilns 2012 002 5979.tiff
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Summary[edit]
High Temperature Firing_of Steatite Chip ( ) | |||||||||||||||||||||
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Photographer |
Herb Radin and Associates |
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Title |
High Temperature Firing_of Steatite Chip |
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Description |
4. Trays containing the "green" substrates are placed into large ceramic kilns for an initial firing. Programmed electronic controls automatically cycle the firing temperatures from ambient to approximately 2,400°F. By carefully controlling the raw material processes and pressing operation, substrate dimensional tolerances after firing are held to within +/- 0.0015". After firing, the substrates are tumbled to remove fired flash and sharp edges. The substrate surface is now ready to receive the resistive and conductive materials. Published without a copyright notice in "The making of a cermet trimmer, 1966" in Beckman Instruments' newsletter Helinews, number 36, Spring 1966, pp. 4-5. Part of a two-page spread detailing the process of manufacturing cermet trimmers. |
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Date |
1966 date QS:P571,+1966-00-00T00:00:00Z/9 |
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Collection |
institution QS:P195,Q5090408 |
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Accession number |
Beckman Historical Collection |
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Credit line | Science History Institute. | ||||||||||||||||||||
Notes | Image downloaded with permission from the Science History Institute, as part of the Wikipedian in Residence initiative. | ||||||||||||||||||||
Source | https://digital.sciencehistory.org/works/9019s324t | ||||||||||||||||||||
Permission (Reusing this file) |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 19:25, 17 April 2020 | 1,064 × 679 (2.76 MB) | Mary Mark Ockerbloom (talk | contribs) | == {{int:filedesc}} == {{Photograph |photographer = Herb Radin and Associates |title = High Temperature Firing_of Steatite Chip |description = 4. Trays containing the "green" substrates are placed into large ceramic kilns for an initial firing. Programmed electronic controls automatically cycle the firing temperatures from ambient to approximately 2,400°F. By carefully controlling the raw material processes and pressing operation, substrate dimensional to... |
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Camera manufacturer | Phase One |
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Camera model | IQ3 80MP |
Exposure time | 1/60 sec (0.016666666666667) |
ISO speed rating | 50 |
Date and time of data generation | 17:19, 5 February 2018 |
Width | 1,064 px |
Height | 679 px |
Compression scheme | Uncompressed |
Pixel composition | RGB |
Orientation | Normal |
Number of components | 4 |
Number of rows per strip | 30 |
Horizontal resolution | 300 dpi |
Vertical resolution | 300 dpi |
Data arrangement | chunky format |
Software used | Capture One 10 Macintosh |
Exposure Program | Manual |
Exif version | 2.3 |
Date and time of digitizing | 17:19, 5 February 2018 |
APEX shutter speed | 5.9068910006751 |
Metering mode | Average |
Light source | Other light source |
Focal plane X resolution | 1,923.0769348191 |
Focal plane Y resolution | 1,923.0769348191 |
Focal plane resolution unit | 3 |
Sensing method | One-chip color area sensor |
File source | Digital still camera |
Scene type | A directly photographed image |
White balance | 5 |
Unique image ID | 00005000008200000400E05800005EFF |