File:Trench doubling.svg
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Size of this PNG preview of this SVG file: 392 × 487 pixels. Other resolutions: 193 × 240 pixels | 386 × 480 pixels | 618 × 768 pixels | 824 × 1,024 pixels | 1,648 × 2,048 pixels.
Original file (SVG file, nominally 392 × 487 pixels, file size: 3 KB)
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Summary
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| Description |
English: The basic process for doubling trenches or holes.
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| Date | |
| Source | Based on the JPG drawing. SVG: Own work |
| Author |
JPG Drawing: Guiding light at en.wikipedia |
| Other versions |
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Licensing
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I, the copyright holder of this work, hereby publish it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
This file is licensed under the Creative Commons Attribution 3.0 Unported license.
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File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:48, 26 November 2011 | | 392 × 487 (3 KB) | Wdwd (talk | contribs) | == {{int:filedesc}} == {{Information |Description={{en|The basic process for doubling trenches or holes. * Top: Photoresist is coated over the starting trench or hole pattern. * Center: Holes or trenches are exposed and etched into the underlying layer. * |
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- Usage on en.wikipedia.org
