Category:Extreme ultraviolet lithography

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extreme ultraviolet lithography 
a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Lithographie EUV.jpg
Extreme Ultra-violet (EUV) technology with reflection masks permits lithography of 45nm features (source: Nanocomputers and Swarm Intelligence, Jean-Baptiste Waldner, ISTE, London, 2007)
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Instance ofNext-generation lithography,
ultraviolet lithography
Facet ofultraviolet lithography
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Fotolitografia ultravioleta extrema (es); 極端紫外線リソグラフィ (ja); Lithographie Extreme UltraViolet (fr); фотолитография в глубоком ультрафиолете (ru); Fotolitografia ultraviolada extrema (electrònica) (ca); Litografia ultravioletta estrema (it); 极紫外光刻 (wuu); لیتوگرافی به وسیله اشعه ماوراء بنفش (fa); extreme ultraviolet lithography (en); ekstremultraviola litografio (eo); 极紫外光刻 (zh); EUV-Lithografie (de) a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. (en); procédé de photolithographie assez semblable aux procédés de lithographie classiques actuels2 . Il utilise un rayonnement ultraviolet (UV) d'une longueur d'onde de l'ordre de 10 à 15 nanomètres (rayons X-mous) (fr); ein Fotolithografie-Verfahren, das extrem ultraviolette Strahlung nutzt (de) EUV lithography (es); Technologie EUV, Lithographie extrême ultraviolet (fr); EUV-Lithographie, EUVL (de); EUV lithography, EUVL (en); EUV-litografio, EUVL (eo); EUVL, фотолитография в сверхжёстком ультрафиолете (ru); EUVL (ca)

Media in category "Extreme ultraviolet lithography"

The following 97 files are in this category, out of 97 total.