File:Ion implanter schematic.png

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Ion_implanter_schematic.png (500 × 486 pixels, file size: 32 KB, MIME type: image/png)

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Description
English: Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. Image created using Tgif.
Date
Source Own work
Author Daniel Schwen
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GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.
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This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.
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This licensing tag was added to this file as part of the GFDL licensing update.

File history

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Date/TimeThumbnailDimensionsUserComment
current21:48, 3 July 2005Thumbnail for version as of 21:48, 3 July 2005500 × 486 (32 KB)Dschwen (talk | contribs)Schematics of an mass separating en:ion implantationimplantation/deposition setup. Ion energy at the substrate is determined by the difference of U<sub>accell</sub> and U<sub>decell</sub>. Image created by user:Dschwen u

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