File:Ion implanter schematic.png
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Ion_implanter_schematic.png (500 × 486 pixels, file size: 32 KB, MIME type: image/png)
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[edit]DescriptionIon implanter schematic.png |
English: Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. Image created using Tgif. |
Date | |
Source | Own work |
Author | Daniel Schwen |
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[edit]Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.http://www.gnu.org/copyleft/fdl.htmlGFDLGNU Free Documentation Licensetruetrue |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 21:48, 3 July 2005 | 500 × 486 (32 KB) | Dschwen (talk | contribs) | Schematics of an mass separating en:ion implantationimplantation/deposition setup. Ion energy at the substrate is determined by the difference of U<sub>accell</sub> and U<sub>decell</sub>. Image created by user:Dschwen u |
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